Semiconductor device layout and channeling implant process

ABSTRACT

A device structure and method for forming graded junction using a implant process. Embodiments of the invention comprise implanting ions into said silicon substrate to form doped regions adjacent to said gate. The orientation of the channel region in the Si crystal structure (channel direction &lt;100&gt;) in combination with the large angle tilt and twist implant process produce doped regions that have a more graded junction. The orientation and implant process creates more channeling of ions. The channeling of ions creates a more graded junction. When implemented on a HV MOS TX, the graded junction of the LDD increases the breakdown voltage. Another embodiment is a FET with an annular shaped channel region.

BACKGROUND OF INVENTION

1) Field of the Invention

This invention relates generally to fabrication of semiconductor devicesparticularly to the fabrication of implanted doped regions in asemiconductor device that has a graded junction

2) Description of the Related Art

With higher levels of integrated circuits on semiconductor chips and theneed for faster transistors in these circuits, the FET transistor mustmaximize all aspects of semiconductor physics to fabricate transistorsin these circuits with faster switching speed.

As the transistor scaling to smaller dimension, the inventor have foundthat high Vt NMOS transistor is facing a problem with voltagelimitation. Thermal cycle was limited because of the consideration oflogic device in the wafer. An aspect of this invention address issue.

In crystalline solids, such as monocrystalline silicon, the atoms whichmake up the solid are spatially arranged in a periodic fashion. Thisperiodic arrangement of atoms in a crystal is called a lattice. Thecrystal lattice always contains a volume which is representative of theentire lattice and it is regularly repeated throughout the crystal. Thedirections in a lattice are expressed as a set of three integers withthe same relationship as the components of a vector in that direction.The three vector components are given in multiples of the basic vectors.For example, in cubic lattices, such as silicon which has a diamondcrystal lattice, the body diagonal has the components of 1 a, 1 b, and 1c and this diagonal exist along the [111] direction with the [ ]brackets being used to denote a specific direction. However, manydirections in a crystal are equivalent, depending on the arbitrarychoice of orientation of the axes. Such equivalent directions aredenoted with < > brackets and, for example, crystal directions in thecubic lattice [100], [010], and [001] are all crystallographicallyequivalent and are <100> directions. Since these directions will also beon the negative side of the origin, as arbitrarily defined, they alsoare identified with a (−) over the specific negative integer, such as[{overscore (1)}00], [0{overscore (1)}0], and [00{overscore (1)}] for<100> directions. Unless specifically stated or shown in the followingdescription in this application, a crystal direction includes bothpositive and negative integers.

Planes in a crystal also can be determined with a set of three integersh, k, and l. They are used to define a set of parallel planes and eachset of three integers in ( ) parentheses identify a specific plane. Asin the case of directions, many planes in a lattice are equivalent andthe indices of such equivalent planes are denoted by { } parentheses.For cubic lattices, direction [k,l,m] is perpendicular to a plane withthe identical three integers (k,l,m). Thus, if either a direction or aplane of a cubic lattice is known, its perpendicular counterpart can bequickly determined without calculation. For example, for planes ofequivalent symmetry such as {100} plane, the equivalent planes are(100), (010), (001), (100), (010), and (001). Like the crystaldirection, the crystal plane in the following description in thisapplication includes both positive and negative integers unlessspecifically stated otherwise.

General terminology is: ( ) for a certain plane; { } for a group ofplanes; [ ] for a certain direction; < > for a group of directions.

Ion implant processes are important to forming doped regions insubstrates. The depth to which an ion becomes implanted is proportionalto its kinetic energy. The implanted distribution in an amorphous targetis roughly a Gaussian distribution characterized by a mean, known as therange, and a standard deviation, known as the straggle. In a singlecrystal target, the range and straggle for a given implant may bedifferent than that in amorphous material, due to a phenomena known aschanneling. Higher ion energy, higher silicon temperature, and thegrowth of silicon dioxide layers on the silicon all tend to dechannelimplants. In any event, range and straggle data for various materialsincluding silicon, silicon dioxide, and photoresist have beendetermined.

The more relevant technical art in the patent literature is as follows:U.S. Pat. No. 5,970,300(Buynoski) shows an alignment of a FET on awafer.

U.S. Pat. No. 6,566,204(Wang, et al.) teaches the use of mask shadowingand angled implantation in fabricating asymmetrical field-effecttransistors.

U.S. Pat. No. 6,599,804(Bulucea, et al.) shows a fabrication offield-effect transistor for alleviating short-channel effects.

U.S. Pat. No. 4,728,617(Woo, et al.) shows a method of fabricating aMOSFET with graded source and drain regions using a high tilt I/I.

However, there is a need for an improved process and device.

SUMMARY OF THE INVENTION

It is an object of an embodiment the present invention to provide adevice and method for fabricating a transistor with a graded dopedregion.

It is an object of an embodiment the present invention to provide a highvoltage MOS device that has a higher breakdown voltage.

Some embodiments of the invention comprise implanting ions into saidsilicon substrate to form doped regions adjacent to said gate. Theorientation of the channel region in the Si crystal structure (channeldirection <100>) in combination with the large angle tilt and twistimplant process that increases channeling (described below) producesdoped regions that have a more graded (gradual) junction.

With the embodiment's (a) transistor with a channel direction at <100>and (b) the 45 tilt and 45 twist implant, the implanted ions enter thesubstrate at the <1 1 0> direction. This direction increases thechanneling of the ion to create a graded junction.

An embodiment is a method of fabrication of doped regions in asemiconductor device; comprising the steps of:

-   -   a) providing a {001} silicon substrate;    -   b) forming a gate over said silicon substrate; said gate having        a width and a length; a channel under the gate; said channel        having a channel direction parallel with the direction of said        gate width; said channel direction is [100] or [010] direction;    -   c) implanting ions into said silicon substrate to form a doped        region adjacent to said gate; the implantation of ions comprises        a large angle tilt implant with a twist of between about 40 and        50 degrees and a tilt angle of 40 and 50 degrees.

Another aspect of the embodiment is where said doped region is a N-LDDin an offset LDMOS FET.

Another aspect of the embodiment is where said ions being implantedabout along the [110] directions of the silicon substrate.

Another aspect of the embodiment is where the implanting of said ions isperformed in one implant step at an about 45 degree twist implant and atilt angle of about 45 degrees. Another aspect of the embodiment iswhere said silicon substrate has a notch/flat at a [110] direction.

Another aspect of the embodiment is where the implanting of ion furthercomprises: said silicon substrate has a notch/flat at a <110> direction,the implantation comprises an implant with a 45 tilt and 45 twist andthe ions enter the substrate aligned at a <0 −1 −1> direction wherebythe direction increases the channeling.

Another aspect of the embodiment is where said channel has an annularshape with a doped region on the inside of said channel and a seconddoped region surrounding the outside of said channel.

Another aspect of the embodiment is where said channel has an annularshape with a doped region on the inside of said channel region and asecond doped region surrounding the outside of said channel; and theimplanting of said ions further comprises a quadra implant at the twistangles of about 45, 135, 225 and 315 degrees with a range of +/−5degrees; and a tilt angle between 40 and 50 degrees.

Another aspect of the embodiment is where said channel has an annularshape with a doped region on the inside of said channel and a seconddoped region surrounding the outside of said channel region; and theimplanting of said ions further comprises a quadra implant with the ionbeams aligned with the <110> direction within plus/minus 2 degrees.

The orientation and implant process creates more channeling of ions. Thechanneling of ions creates a more graded junction.

When implemented on a HV MOS Tx, the graded junction of the LDDincreases the drain breakdown voltage.

The above and below advantages and features are of representativeembodiments only, and are not exhaustive and/or exclusive. They arepresented only to assist in understanding the invention. It should beunderstood that they are not representative of all the inventionsdefined by the claims, to be considered limitations on the invention asdefined by the claims, or limitations on equivalents to the claims. Forinstance, some of these advantages may be mutually contradictory, inthat they cannot be simultaneously present in a single embodiment.Similarly, some advantages are applicable to one aspect of theinvention, and inapplicable to others. Furthermore, certain aspects ofthe claimed invention have not been discussed herein. However, noinference should be drawn regarding those discussed herein relative tothose not discussed herein other than for purposes of space and reducingrepetition. Thus, this summary of features and advantages should not beconsidered dispositive in determining equivalence. Additional featuresand advantages of the invention will become apparent in the followingdescription, from the drawings, and from the claims.

BRIEF DESCRIPTION OF THE DRAWINGS

The features and advantages of a semiconductor device according to thepresent invention and further details of a process of fabricating such asemiconductor device in accordance with the present invention will bemore clearly understood from the following description taken inconjunction with the accompanying drawings in which like referencenumerals designate similar or corresponding elements, regions andportions and in which:

FIG. 1A is a top down view of a wafer having a transistor according to aprocess known to the inventor.

FIG. 1B shows a schematic view of a twist and tilted ion implantaccording to the prior art for use in understand the terms “twist” and“tilt”.

FIG. 2A shows a FET with a channel direction 202 in a <100> directionaccording to an embodiment of the invention.

FIG. 2B shows a FET with a channel direction 204 in a <110> directionaccording to an embodiment of the invention.

FIG. 3A is a top down view of a wafer showing the channel orientation ina 45 degree twist and 45 degree tilt implant according to an embodimentof the invention.

FIG. 3B is a top down view of a wafer showing the channel orientation<010> in a 45 degree twist and 45 degree tilt implant according to anembodiment of the invention.

FIG. 4A shows a top down view of a embodiment of a closed shapedtransistor according to an embodiment of the invention.

FIG. 4B shows a cross sectional view of the closed FET shown in FIG. 4Aalong the axis 4B according to an embodiment of the invention.

FIG. 5 shows a plot of the phosphorus concentration of the gradedjunction N-LDD of the embodiment in a normal V MOS TX compared to aconventional Ph profile.

FIG. 6 shows both a standard 0 degree channel 102 104 FET and theembodiments' 45 degree angled channel 202 204 FETs formed on a wafer.

FIG. 7 shows an example of an offset LDMOS TX according to an embodimentof the invention. The channel for the LDNMOS TX is preferably a p-well.

FIG. 8 shows an example of a non-offset LDMOS TX formed using theembodiment's channel maximizing implant process for the source anddrain.

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS II.Introduction—Current Industry Channel Direction with Respect to theCrystal Direction

Referring now to the drawing and more particularly to FIG. 1A, there isshown a structure over which the present invention is an improvement.

FIG. 1A is a top down view of a wafer having a transistor. The wafer is{001}. The channel direction 102 is <110>. The channel direction is thedirection between source and drain or drain and source. The channeldirection is the direction current flows between the source and drain ordrain and source. In current 8 inch P-type wafer technology, the notchis along the <110> direction as shown in FIG. 1A.

In manufacturing the FET with the source (S) and drain (D) separated bythe gate (G) and having a channel (C) thereunder, the notch permitsalignment of the wafer relative to the exposure masks so that the gatewidth and the channel length thereunder will be parallel orperpendicular with [110] crystal direction.

Problem of Voltage Limitation on Hi Vt NMOS

As the transistor scaling to smaller dimension, our high Vt NMOStransistor is facing a problem with voltage limitation. Thermal cyclewas limited because of the consideration of logic device in the wafer.

Currently for high voltage transistor, we need to use high tiltimplantation and long time diffusion in order to make the lateraljunction of the LDD more graded. For example a lateral diffusion metaloxide semiconductor {LDMOS} was used for high voltage usage. However theLDD regions of the LDMOS need long time (several hours) diffusion to geta graded junction which can sustain high voltage. For sub-microntechnology, because of the thermal cycle become more critical. Lowerthermal cycle was needed because of the transistor dimension. In thiscase, LDMOS is not popular for small dimension high voltage transistor.There are mainly two high voltage transistors in the foundry forsub-micron transistors, offset transistor and non-offset transistor.Offset transistor use asymmetrical structure to get higher breakdownvoltage. Non-offset structure use higher tilt angle for lateral dopeddrain (LDD) implantation to increase the breakdown voltage.

Overview of Embodiments of the Invention

In this example embodiment, a special layout for a high voltagetransistor is introduced. A set of specific implantation method is givenaccordingly. A main advantage of this embodiment is to use the siliconcrystalogy to get higher channeling effect through special implantationangle and rotation. Accordingly the layout for this implantation wasoptimized in order to get a more graded junction.

We implant ions into the {0 0 1} silicon substrate to form doped regionsadjacent to the gate. The orientation of the channel region in the Sicrystal structure (channel direction <100>) in combination with thelarge angle tilt and twist implant process (describe below) producesdoped regions that have a more graded (gradual) junction. Theorientation and implant process creates more channeling of ions. Thechanneling of ions creates a more graded (less abrupt) junction.

Embodiments of the invention include open and closed shaped transistorsand doped regions. An example of a closed shaped Tx is shown in FIG. 4A.Other embodiments include 45 degree twist/45 degree tilt implants. Otherembodiment include quadra twist and tilt implants.

With the embodiments of the invention, we can improve breakdown voltageof HV transistor. More graded junction LDD can be obtained without usinglong diffusion time.

In accordance with the present invention, a standard {001} silicon waferwith a primary notch of <110> direction is used and, before exposure toan image by a lithographic exposure apparatus, the relative relationshipbetween the mask and the {001} silicon wafer is changed so that therelationship, in the same plane, is approximately forty-five degrees (45degree) from the normal relationship in the same plane. Thus, the [110]crystal direction is aligned approximately 45 degrees to the gate widthand will be aligned parallel with channel length direction when voltageis applied to the gate.

This 45 degree change is preferably accomplished by either modifying themask holder or the wafer holder of an optical lithographic system so themask holder and the wafer holder are in a relationship of approximatelyforty-five degrees (45°) from their normal relationship using the <001>crystal direction. The target of the relationship change is exactly 45degree, because the mobility of the carriers in channel will be optimumwhen the channel and [110] crystal direction are parallel. However, dueto slight imperfection of the lithographic apparatus wafer and maskholders, the change may vary by +−2% of the 45 degree change. Theremaining fabrication steps, such as plasma or anisotropic etching,oxidation, chemical vapor deposition, sputtering and planization, areperformed without any modification of the wafer holders, because theexposed surface of the silicon wafer to these processes remains in the<001> direction. Referring to FIG. 6, on the same wafer, both standard 0degree and the embodiments' 45 degree angled channel FETs can be formed.For example, FIG. 6 shows both standard 0 degree channel 102 104 FET andthe embodiments' 45 degree angled channel 202 204 FETs formed on a wafer(source/drain regions not shown).

Another aspect of the present invention is a novel FET with its gateformed perpendicular to the <100> crystal direction so that the channelwill be parallel with this direction with a voltage applied to the gate.

In another aspect of the present invention, annular shaped FETs areformed. FIG. 6 shows annual FETs 602 and 612. FET 612 is has theembodiments channel <100> direction. FET 602 has the <110> channeldirections. Any combination of annular and linear FETs with differentchannel directions can be formed on the same wafer.

The embodiment's <100> channel direction is useful for MOS TX's and canreduce punchthrough.

III. Method of LATID with Channel Orientated in the <100> or <010>Direction

A preferred embodiment of the invention is a method to form a dopedregion in a semiconductor device. The doped region preferably is asource or drain region in a FET and is more preferably a S or D regionin a high voltage transistor such as a LDMOS transistor.

A feature of the process is that a more graded junction is formed by thelarge angled implant process.

{001} Silicon Substrate Having [110] Reference Direction

Referring to FIGS. 2A and 2 b, an orientation of the channel (C) of anFET is shown. We provide a {001} silicon substrate having [110]reference direction (direction from substrate center to primarynotch/flat).

FIG. 2A shows a FET with a channel direction 202 in a <100> direction.

FIG. 2B shows a FET with a channel direction 204 in a <110> direction.

Devices with both channel directions can be formed on the same wafer.

Gate, Source/Drain and Channel

Next, a gate (G) is formed over the silicon substrate; the gate having awidth and a length; a channel under the gate.

The channel (C) has a channel direction (202 204) parallel with thedirection of the gate width. The channel direction is the direction ofcurrent flow direction. The channel direction is preferably about [100]or [010] crystal direction.

Large Angle Implant with Twist to form Source and Drain

We implant ions into the silicon substrate to form doped regionsadjacent to the gate. The orientation of the channel region in the Sicrystal structure (channel direction <100>) in combination with thelarge angle tilt and twist implant process (describe below) producesdoped regions that have a more graded (gradual) junction. Theorientation and implant process creates more channeling of ions. Theions are preferably implanted along the <110> direction to maximizechanneling. The channeling of ions creates a more graded junction.Channeling is when implanted ions are not slowed by collisions withsilicon atoms. It is controlled by three different techniques: wafertilt, screen oxide layer or preamorphization. This embodiment preferablydoes not use these techniques to reduce channeling.

When implemented on a HV MOS Tx, the graded junction of the LDDincreases the drain breakdown voltage.

FIG. 1B shows a schematic view of a twist and tilted ion implantaccording to the prior art for use in understand the terms “twist” and“tilt”.

Tilt is the angle between the wafer surface and the ion beam.

Twist is the angle between the vertical plane containing the ion beamand the vertical plane perpendicular to the reference direction (primarynotch direction).

Single Implant at 45 Tilt and 45 Twist

As shown in FIG. 3A, the implantation of ions preferably comprises atilt/twist implant with a twist of about 45 degree from the <110>reference direction (notch) of the crystal substrate and a tilt anglebetween 40 and 50 degrees (from the normal plane of the substratesurface) and more preferably a tilt angle of 45 degrees with a preferredtolerance of +/−5 degrees.

For a (001) wafer (e.g., with a notch of <110>) direction, a implantwith a 45 tilt and 45 twist, the ions enter the substrate at a <0 −1 −1>(or <0{overscore (11)}>) direction (or [110] group direction). Thisdirection increases the channeling.

The 45 tilt and 45 twist single implant is preferably performed byimplanting Ph ions at an energy between 40 and 400 and a dose between1E12 and 1E15 at tilt angle between 40 and 50 degrees and morepreferably about 45 degrees and a twist angle of between 40 and 50degrees and more preferably 45 degrees.

This 45 degree twist and 45 degree tilt implant preferably forms a(symmetric) LDD.

FET with a Source (S) and Drain (D) and Gate (G) with a ChannelDirection of <100>

FIG. 3B shows a top down view of a FET with a Source (S) and Drain (D)and gate (G) with a channel direction of <100> and a reference direction<110> (also for the primary notch).

For a 45 degree twist implant and a 45 degree tilt, the ions areimplanted into the S/D region along direction B. Direction B is parallelto the <0{overscore (11)}> (or <0 −1 −1>).

“Quadra” Implant for Open Shaped tx

In a preferred embodiment the implanting of ions into further comprisesan quadra implant. The quadra implant is performed by 4 implants of Phions at an energy between 40 and 400 Kev and a dose between 1E12 and1E15 ions/sq-cm at tilt angle between 40 and 50 degrees and a twistangles of between 40 and 50 degrees

FIG. 3C illustrates the embodiment's quad implant. The 4 implants at 45,135, 225, and 315 degrees.

In the quadra implant, the implanted ions are aligned in the [0,−1,−1],[1,0,−1], [0,1,−1], [−1,0,−1] or <110> directions. (the negative signsrepresent bars over the 1's, e.g. −1 is equivalent to {overscore (1)})This maximizes channeling.

Closed Shaped (or Annual Shaped) Channel Region

Referring to FIG. 4A and FIG. 4B, an embodiment is shown where thetransistor has a channel region with a “closed shape” so that S/D regionon the inside of the channel region and a second doped regionsurrounding the outside of the channel region.

FIG. 4A shows a top down view of a embodiment of a closed shapedtransistor (e.g., with annular shaped channel region). FIG. 4 showsfield oxide regions 402, LDD regions 406 414, source/drain regions 407415 (see FIG. 4B) and gate 410. The LLD regions are preferably formed bythe embodiment's implant process. The “closed shape” means that theactive region has no beginning or end. The channel under the gate 410 issurrounded by the LDD 406. The channel is preferably annular shaped andis more preferably rectangular or square shaped.

FIG. 4B shows a cross sectional view of the closed FET shown in FIG. 4Aalong the axis 4B according to an embodiment of the invention. FIG. 4Bshow a gate dielectric layer 412 under the gate 410.

The embodiments of the annular channel Tx can be a normal voltage Tx ora offset LDMOS or a Non-offset LDMOS.

Quadra Implant Method for Closed (e.g., Annular) Channel Region

For the closed shaped doped region, for example as shown in FIG. 4A,preferably a quadra implant is performed.

HV LDMOS TX with Offset Transistor and Non-Offset Transistors

The channel orientations and implant embodiments of the invention on canbe used to form HV LDMOS TX with offset transistor and non-offsettransistors.

FIG. 7 shows an example of an offset LDMOS TX. The channel is a diffusedp-well for the LDNMOS TX.

In the offset LDMOS TX (FIG. 7), only the N-LDD is formed using theembodiment's ion implant at [110] to maximize the ion channeling.

In the non-offset LDMOS TX (FIG. 8), preferably the N+ source and the N+drain are simultaneously formed in the same implant step using theembodiment's ion implant at [110] to maximize the ion channeling.

Process for Offset LDMOS TX (FIG. 7)

The process to form the OFFset LDMOS TX is as follows:

-   -   form p-epi on substrate    -   form p-well    -   form (poly) gate    -   form N-LDD (using embodiments' channeling maximizing ion        implant)    -   form spacers on gate    -   form source (S) and drain (D) using a standard I/I.

Currently, the offset LDMOS Tx operates at a voltage between about 18Vand 60 V. In comparison a normal voltage Tx operates between about 1V to18V.

Non-Offset LDMOS TX

FIG. 8 shows an example of a non-offset LDMOS TX. Usually we use a lotof diffusion to get a smooth and graded junction between the N+ andp-well. With the embodiment's wafer alignment and drain implant process,a good graded junction can be obtained. The breakdown voltage decreaseswith the embodiment because of the graded junction.

Process for Non-Offset LDMOS TX

The process to form the FIG. 8, non-offset LDMOS TX is as follows:

-   -   form p-epi on substrate    -   form p-well    -   form poly gate    -   form N-LDD (using embodiments' channeling max ion implant)    -   form spacers form N+ source and drain using invention's        maximizing channeling ion implant.

Currently, the non-offset LDMOS Tx operates at a voltage between about12V and 25 V. In comparison a normal voltage Tx operates between about1V to 18V.

IV. EXAMPLES

The following non-limiting examples represent preferred forms and bestmodes contemplated by the inventor for practice of his invention, aswell as illustrating the results obtained through its use.

High Voltage LDMOS transistor were fabricated using the standardtransistor orientation shown in FIG. 1 and an embodiments orientationshown in FIG. 2A (e.g., channel in <100> direction). Ph ions wereimplanted at the conditions shown in the table below to form the N-LDD.TABLE comparison of embodiment and standard LDD implants 45° tilt and30° tilt and parameter 45°twist implant 0° twist implant dose 1E12atoms/sq-cm 1E12 atoms/sq-cm energy   80 Kev   80 Kev Junction depth0.75 μm  0.5 μm Breakdown 16.2 V 14.0 V voltage

As shown in the table above, the embodiment's 45° tilt and 45° twist LDDimplant had a deeper junction depth and a higher breakdown voltage.

The LDD implant on the embodiment's transistor orientation has increasedchanneling of ion that creates a deeper and more graded junction. Thereduces the breakdown voltage. This is important especially on the HVtransistor.

FIG. 5 shows a plot of the phosphorus concentration of the gradedjunction N-LDD of the embodiment in a normal V MOS TX compared to aconventional Ph profile. The boron concentration of about 1E18 is theconcentration of the p-well. (See e.g., FIGS. 7 and 8.)

V. Ending

In summary, a new set of layout and implantation methods was given inthe embodiments of this invention. A purpose is to use crystal structureof silicon to improve the junction or the LDD or S/D to obtain highbreakdown voltage. It can be used for DMOS and HVNMOS and other highvoltage transistor and normal MOS Transistors.

The embodiments' implant process can be performed on any wafer so thatthe ions enter the wafer in the [110] direction. The embodiments are notdependents on any configuration of wafer notches and/or flats. Theorientation of notches and flat change with wafer technology.

Given the variety of embodiments of the present invention justdescribed, the above description and illustrations show not be taken aslimiting the scope of the present invention defined by the claims.

While the invention has been particularly shown and described withreference to the preferred embodiments thereof, it will be understood bythose skilled in the art that various changes in form and details may bemade without departing from the spirit and scope of the invention. It isintended to cover various modifications and similar arrangements andprocedures, and the scope of the appended claims therefore should beaccorded the broadest interpretation so as to encompass all suchmodifications and similar arrangements and procedures.

1. A method of fabrication of doped regions in a semiconductor device;comprising the steps of: a) providing a {001} silicon substrate; b)forming a gate over said silicon substrate; said gate having a width anda length; a channel under the gate; said channel having a channeldirection parallel with the direction of said gate width; said channeldirection is [100] or [010] direction, c) implanting ions into saidsilicon substrate to form a doped region adjacent to said gate; theimplantation of ions comprises a large angle tilt implant with a twistof between about 40 and 50 degrees and a tilt angle of 40 and 50degrees.
 2. The method of claim 1 wherein said doped region is a N-LDDin an offset LDMOS FET.
 3. The method of claim 1 wherein said ions beingimplanted about along the [110] directions of the silicon substrate. 4.The method of claim 1 wherein the implanting of said ions is performedin one implant step at an about 45 degree twist implant and a tilt angleof about 45 degrees.
 5. The method of claim 1 wherein said siliconsubstrate has a notch/flat at a [110] direction.
 6. The method of claim1 wherein the implanting of ions further comprises: said siliconsubstrate has a notch/flat at a <110> direction, the implantationcomprises an implant with a 45 tilt and 45 twist and the ions enter thesubstrate aligned at a <0 −1 −1> direction whereby the directionincreases the channeling.
 7. The method of claim 1 wherein said channelhas an annular shape with a doped region on the inside of said channeland a second doped region surrounding the outside of said channel. 8.The method of claim 1 wherein said channel has an annular shape with adoped region on the inside of said channel region and a second dopedregion surrounding the outside of said channel; and the implanting ofsaid ions further comprises a quadra implant at the twist angles ofabout 45, 135, 225 and 315 degrees with a range of +/−5 degrees; and atilt angle between 40 and 50 degrees.
 9. The method of claim 1 whereinsaid channel has an annular shape with a doped region on the inside ofsaid channel and a second doped region surrounding the outside of saidchannel region; and the implanting of said ions further comprises aquadra implant with the ion beams aligned with the <110> directionwithin plus/minus 2 degrees.
 10. The method of claim 1 which furtherincludes forming a High Vt NMOS FET from said gate and doped regions.11. The method of claim 1 wherein a LDMOS device is formed.
 12. Themethod of claim 1 which further comprises forming a second gate oversaid silicon substrate; said second gate having a width and a length; asecond channel under the second gate; said second channel having asecond channel direction parallel with the direction of width of saidsecond gate; said second channel direction is parallel or perpendicularwith the <110> direction. 13-39. (canceled)
 40. The method of claim 1wherein the implanting of ions further comprises: the implantationcomprises an implant with a 45 tilt and 45 twist and the ions enter thesubstrate aligned at a <0 −1 −1> direction whereby the directionincreases the channeling.